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A Method to Simulate the Observed Surface Properties of Proton Irradiated Silicon Strip Sensors

机译:一种模拟质子观察表面性质的方法   辐照硅片传感器

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摘要

During the scheduled high luminosity upgrade of LHC, the world's largestparticle physics accelerator at CERN, the position sensitive silicon detectorsinstalled in the vertex and tracking part of the CMS experiment will face moreintense radiation environment than the present system was designed for. Toupgrade the tracker to required performance level, extensive measurements andsimulations studies have already been carried out. A defect model of SynopsysSentaurus TCAD simulation package for the bulk properties of proton irradiateddevices has been producing simulations closely matching with measurements ofsilicon strip detectors. However, the model does not provide expected behaviordue to the fluence increased surface damage. The solution requires an approachthat does not affect the accurate bulk properties produced by the proton model,but only adds to it the required radiation induced properties close to thesurface. These include the observed position dependency of the strip detector'scharge collection efficiency (CCE). In this paper a procedure to find a defectmodel that reproduces the correct CCE loss, along with other surface propertiesof a strip detector up to a fluence $1.5\times10^{15}$ 1 MeV n$_{\textrm{eq}}$cm$^{-2}$, will be presented. When applied with CCE loss measurements atdifferent fluences, this method may provide means for the parametrization ofthe accumulation of oxide charge at the SiO2/Si interface as a function ofdose.
机译:在欧洲核子研究组织(CERN)全球最大的粒子物理加速器LHC计划的高光度升级期间,安装在CMS实验的顶点和跟踪部分中的位置敏感型硅探测器将面临比当前系统设计的更恶劣的辐射环境。为了将跟踪器升级到所需的性能水平,已经进行了广泛的测量和模拟研究。 SynopsysSentaurus TCAD模拟软件包的缺陷模型,用于质子辐照设备的整体性能,已经产生了与硅条检测器的测量值非常接近的模拟。但是,由于注量增加了表面损伤,该模型无法提供预期的行为。该解决方案需要一种方法,该方法不影响质子模型产生的准确的体积特性,而仅向其添加接近表面的所需辐射诱导特性。这些包括观察到的带钢检测器电荷收集效率(CCE)的位置依赖性。在本文中,找到一种缺陷模型的过程,该缺陷模型​​可再现正确的CCE损失以及带状检测器的其他表面特性,直到通量为$ 1.5 \ times10 ^ {15} $ 1 MeV n $ _ {\ textrm {eq}} $ cm $ ^ {-2} $,将显示。当在不同注量下应用CCE损耗测量时,此方法可为SiO2 / Si界面上的电荷累积量作为剂量的函数提供参数化方法。

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